薄膜厚度测量仪

活动范围 300mm x 300mm
测量范围 100Å~ 35㎛(Depends on Film T*e)
光斑尺寸 40㎛/20㎛,4㎛(option)
测量速度 1~2 sec./site (fitting time)
应用领域 All Capability of ST2000 & More Precision Measurement
Intended for Large Size Wafer Measure
选择 Reference sample(K-MAC or KRISS or NIST)
Anti-vibration table
接物镜转换器 Quintuple Revolving Nosepiecs
焦点 Coaxial Coarse and Fine Focus Controls
附带照明 12v 100W Halogen Lamp